There followed a multitude of development projects related to industrial large-area coating, such as the electron beam based high-rate vacuum coating of steel strip with aluminum for the packaging industry (1966), a series of batch type facilities for the production of high-quality capacitor foil for the electronics industry (1969), or the first vacuum coating plant with inner storage for the production of heat insulating flat glass for architectural glazings (1972).
If vapor coating in its different varieties dominated the first projects concerned with large-area coating, the triumphant progress of the sputter technologies began in 1974 using the new key component “annular slot magnetron”. Sputtering has specific technological advantages, such as stoichiometric exactitude, long-term stability and homogeneity of coating. It has gradually come to dominate vacuum coating technology.
The predecessor of the annular slot magnetron was the development of an ion getter pump of analog build for the production of low-oxygen ultravacuums in 1963, which already possessed all the significant functional elements of the later magnetron. However, its potential for large-area coating was only recognized 10 years later.