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Kunden Lieferanten Intern
 

key components

Offers for our R&D + Pilot Systems and for the upgrading of sytems delivered by us:

  • Sputtering
  • Evaporation
  • PECVD/CVD/ALD/Plasmapolymerization
  • Sputter etching/ion etching/plasma treatment
  • Heat treatment
  • Substrate holder and manipulation
  • Process control
Overview
Vertical Inline
Horizontal Inline
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Key Components
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evaporation

Dual Filament Effusion Cell
CT CHALCO
Evaporation material: Se, S, ... 
Crucible volume: 200 cm3
Power: max. 900 W (effusion cell) und 500 W (hot-lip) 

Integration conditions/design: 

  • DN CF 100; Mo
  • effusion cells and hot-lip temperature  0 oC - 1300 oC
  • water cooling is optional 
  • manual, electric or pneumatic diaphragm drive

Dual Filament Effusion Cell
CT CIG
Evaporation material: Ga, In, Cu 
Crucible volume: 150 cm3
Power: max. 560 W (effusion cell) und 1100 W (hot-lip) 

Integration conditions/design: 

  • DN CF 100; pyrolytic boron nitrid
  • effusion cell and hot-lip temperature 0 oC- 1500 oC
  • water cooling is optional
  • manual, electric or pneumatic diaphragm drive

Dual Filament Effusion Cell
CT Si-DOP
Evaporation material: silicon dopants
Crucible volume: 100 cm3
Power: max. 1300 W (effusion cell) und 700 W (hot-lip)

Integration conditions/design: 
  • DN CF 100; pyrolytic boron nitrid
  • water cooling is optional
  • manual, electric or pneumatic diaphragm drive

Electron Beam Evaporator
FT EV M-6
Evaporation material: Cr, Cu, Al, Ag, Ti,...; SiO2, Ta2O5,...; multiple layers; large area coating 
Crucible volume: 4x8 cm3
Power: ≤5000 W

Integration conditions/design:  

  • multi-hole-crucible and other systems 
  • operating pressure ≤ 5·10-3 mbar
  • distance between source and substrate app. 600 mm  
  • water cooling; 4 - 10 kV
  • beam deflection 270°

Jet Evaporator
JE 15

Evaporation material: Al, Mg... 
Crucible volume: 500 cm3
Power: 15000 W

Integration conditions/design:  

  • water cooling
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        • Key Components
          • Sputtering
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