key components
Offers for our R&D + Pilot Systems and for the upgrading of sytems delivered by us:
Process Control System
VAprocos
Application: Measuring and control system for the stabilization of reactive magnetron sputtering processes;ITO, Nb2O5, SiO2, ZnO:Al, …
Properties:
- available with configurable measuring devices for the definition of the process status: plasma intensity, oxygen particle pressure or MF-/DF catode
- voltage
- up to 8 peripheral analogue/digital modules
X-Ray Fluoroscence Analyzing System
XRF 940 M
Application: analyzing layer thickness and layer composition during evaporation and sputtering
Properties:
- in-situ measuring system for inline equipment
- maximum substrate temperature 500 °C
- Measuring head with control and processing system
- automatic self-adjustment; optical distance sensor
Faraday Cage
CR-CEA4
Application: Ion current and ion energy analysis
Properties:
- operating pressure ≤ 1 × 10-2 mbar
- ion current density = 0,01 … 10 mA/cm2
- ion energy ≤ 300 eV
