VISS300S sputter System (1) for TCO
- Single/inline system for transparent conductive oxides (TCO)
- Load lock chamber, process chamber with 2 sputter stations
- substrate dimensions (300 x 300) mm²
Application
- sputtering of ZnO or ZnO:Al as TCO for thin-film solar cells by means of ZnAl, ZnO:Al2O3 targets
- coating of glass substrates on carriers; substrate dimensions 300 mm x 300 mm, thickness of up to 5 mm,
carrier tilt position of 7o - R&D, pilot production
technology
Deposition
- HF (13.56 MHz) and DC magnetron sputtering, plasma emission monitor control; metal oxide targets
equipment
Load/unload Lock Chamber
- stainless steel chamber
- hydrocarbon free high-vacuum pumping system
Sputter Chamber
- Stainless steel chamber with two processing stations, heaters and overrun sections
- Two rectangular Standard Single Magnetrons SSM750RF/SSM750DC
- Hydrocarbon free high-vacuum pumping system
- Plasma Emission Monitor PEM® 05, oxygen sensor
- Substrate heater
- Gas supply and inlet system
