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equipment platforms

VON ARDENNE has been manufacturing industrial glass coating equipment since 1972. Today, VON ARDENNE is the leading provider of high-end equipment for solar control and heat protection coatings on glass in jumbo and 100" formats.

For the realization of these projects, several equipment platforms are available.

Overview
Equipment Platforms
Key Components
Layer Systems
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glass coating system GC330H and GC254H

The GC330H and GC254H glass coating systems are production coaters for the sputter coating of flat glass substrates with optical multi-layer stacks and are based on the platform "system 780". This platform is the industrial benchmark for the entire range of applications in the architectural glass market.

Technology

The sputter chamber consists of a customized number of universal technological compartments of the advanced 780 mm design. All compartments are identical to provide for maximum flexibility, fit for accepting turbomolecular pumps or sources of different design from Planar Cathodes (WSM) to Rotatable Dual Magnetrons (RDM) for DC or AC sputtering. Additional tools and advanced process control systems can be easily integrated.

Equipment

  • Vacuum process system based on turbomolecular and dry screw pumps
  • Customer is free to re-configure the tooling of the sputter chamber by swapping pump lids, magnetron lids, etc.
  • Maintenance valves for selective venting of adjacent sputter zones are available.

TECHNIcal DATa GC330H

Substrate
  • flat glass
Dimensions (WxL), max. 
  • 3 300 mm x 6 000 mm (standard size, options possible)
Thickness incl. uneveness
  • 3 mm to 19 mm
Cycle time
  • > 25 s
Basic pressure in sputter chamber
  • ≤ 5 x 10-6 mbar
Utility requirements
  • to be defined according to application, cathode configuration and throughput obectives
Mains connection
  • 400 VAC, 50 Hz or according to customer

Manufacturing time

  • up to 4 weeks


TECHNIcal DATa GC254H

Substrate
  • flat glass 
Dimensions (WxL), max. 
  • 2 540 mm x 3 660 mm (standard size, options possible)
Thickness inkl. uneveness
  • 2 mm to 19 mm
Cycle time
  • ≥ 18 s
Basic pressure in sputter chamber
  • ≤ 5 x 10-6 mbar
Utility requirements
  • to be defined according to application, cathode configuration and throughput objectives
Mains connection
  • 400 VAC, 50 Hz or according to customer
Manufacturing time
  • up to 4 weeks

 



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