Zeppelinstrasse 7 in Dresden
 
Am Hahnweg 18 - Technikum in Dresden
 

Milestones in the Corporate History of VON ARDENNE

1928-1945   VON ARDENNE Laboratory for Electron Physics, Berlin
1928   Radio reception with multi-system electron tube
1931   First fully electronic television with flying spot scanner
1934   Electron-optical image converter for night vision devices
1937   First scanning electron microscope (REM)
1939   Universal electron microscope with high resolution and stereo imaging
1943   Cyclotron with 60 t magnet for particle acceleration
1943   Separation of lithium isotopes with toric magnetic field and plasma ion source
1945-1955   Institute for Industrial Isotope Separation,Suchumi/USSR
1948   Duoplasmatron ion source for magnetic isotope separation
1953   Mass spectrograph with dual focus
1955-1990   Research Institute Manfred von Ardenne, Dresden
 
1959   Electron beam multi-chamber furnace (EMO) 60 kW
1963   Plasma precision beam torch
1964   EMO 1200 kW for steelworks „Vakuumstahlwerk Freital“, Germany
1965   Programmable microstructuring of electronic circuits
1966   Ion getter pump with toric magnetic field (Magnetron principle)
1967   First air-to-air metal strip coater
1969   Electron beam welding with automatic beam positioning
1970   Production engineering for microelectronic hybrid circuits
1972   Batch-type vacuum coater of architectural glass
1973   Introduction of DC-Magnetron sputtering
1974   Vacuum coating of capacitor film
1976   High-density magnet memory for satellite technology
1978   TiN-coating for metal-cutting tools
1979   EB-welding of fuel elements for nuclear power plants
1980   Vacuum coating of hot stamping foil
1981   High-performance EB gun with internal isolator and Varioanode
1982   Vacuum coating of packaging
1983   Horizontal in-ine sputter coater for color and semipermeable mirrors
1984   Barrier annealing with electron beams
1985   DC-Magnetron with cylindric rotatable target
1986   AC-Dual Magnetron
1987   Electron beam etching of grain seed
1988   EB-polymerization of solvent-free lacquer surfaces
1989   First vertical in-line sputter coater for architectural glass
1990   Vertikale Inline-Sputteranlage für Flachglas
1991   VON ARDENNE Anlagentechnik GmbH
1992   Batch-type coater MB 300 for metal strip
1993   Planar Dual Magnetron DM 3500
1994   First air-to-air coater ALBA 125 for Al strip
1995   High-performance EB gun with Variokathode
1996   First horizontal in-line sputter coater GC 321 H for architectural glass
1997   Multifunctional cluster system CS 430 S
1998   First EB ceramic coater for gas turbine blades and vanes TUBA 1000
1999   First web coater FOBA 2150 for optical layer systems
2000   First vertical in-line sputter coater GC 175 V/C for the display technology
2001   Air-to-air coater ALBA 125 S for Al strip
2002   First in-line sputter coater GC 120 H for CIS technology
2003   Dual Magnetron with rotatable target RDM 3500
2004   First in-line sputter coater GC 120 H for CdTe technology
2005   „Innovator of the Year“ in the TOP 100 competition
2006   CIS coating technology for PV project in Schwäbisch Hall
2007   Complete coating technology for PV project in Frankfurt/Oder (CdTe)
2008   PV project Kulim (Malaysia) with an annual capacity of 500 MW