XEA|nova® L

wafer coating system

The XEA|nova L is an inline coating system based on our proprietary large-area coating technology. As the coater is wider and can therefore process more substrates at the same time, it is especially suited for high productivity applications at very low costs. It is suited for silicon wafers or other small and even very thin substrates.

Thanks to its modular design, the XEA|nova L can be equipped with rotatable magnetrons for the sputter deposition of high-performance TCO layers or several other materials, such as metals and metal oxides. It can also be adapted for other deposition technologies. The substrates can also be pre-treated by cleaning or etching, either under vacuum or before it enters the vacuum.

The XEA|nova L benefits from our experience gained from delivering more than 150 coating systems to the photovoltaics industry. It is the perfect choice for customers looking for highly productive and flexible production equipment combined with proven technology and design.

Übersicht

Anwendung: Photovoltaik

Substratform: plan/eben

Substratmaterial: Glas, metals, Polymer, Wafer

Beschichtungstechnologie: Magnetronsputtern von oben nach unten, Magnetronsputtern von unten nach oben

Funktion: Antireflexion, Kontakt, Passivierung, TCO

Schichten & Schichtstapel: Ag, Al, AlOx, AZO, Cu, ITiO, ITO, NiV, SiN, SiOx, Ti, TiOx, Zn


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