Since 1980, VON ARDENNE has been in a leading position in reactive sputtering processes. Furthermore, we have provided and optimized our process control system VA PROCOS for many years.
Our current VA PROCOS 2 controls the reactive magnetron sputtering of compound layers (such as ITO, TiO2, TiN, Al2, O3, AlN, SnO2, SiO2, Si3N4, ZnO, ZrO or Ta2O5) and reliably fixes the working points in the crucial transition region. Furthermore, the system controls one or more reactive gas inlets (e.g. oxynitrides).