Wafer Coating System

The XEA|nova is an inline wafer coating system with a carrier return transport. It is specifically designed for high-efficiency solar applications such as TCO and metal layers for heterojunction solar cells (HJT). However, it is also suited for other small substrates.

With this tool, even very thin substrates can be treated on both sides without breaking the vacuum or flipping the substrates. These outstanding features of the XEA|nova enable sequenced but also simultaneous treatments of both substrate surfaces. 

The XEA|nova can be equipped with rotatable magnetrons for sputtering and with various evaporation sources, such as electron beam guns. Special pretreatment of the substrates like cleaning or etching can either take place under vacuum or before the substrate enters the vacuum.

The XEA|nova L is an inline coating system based on our proprietary large-area coating technology. The system is wider than the XEA|nova and can process more substrates at the same time. Therefore, it is especially suited for high productivity applications at very low costs.




Applications: fuel cells, photovoltaics

Substrate shape: flat/rigid

Substrate material: glass, metals, polymer, stainless steel, wafers

Coating Technology: electron beam technology, magnetron sputtering down, magnetron sputtering up

Function: anti-reflection, contact, corrosion protection, passivation, TCO

Layers & Layer stacks: Ag, Al, AlOx, AZO, C, Co, Cr, Cu, ITiO, ITO, Ni, NiV, SiN, SiOx, Ti, TiOx, Zn

Corresponding Components & Systems:
Sputter Components

Corresponding equipment