VISS

vertical glass COATING system

The vertical inline sputter system VISS is an appropriate, modular solution for vertical deposition processes when scaling up from laboratory use to production. The tool is available either as a single end inline or for continuous processing and is uniquely suited for scaling up to substrate sizes of approximately 400 mm x 400 mm.

The substrates are transported by a carrier system, which is tilted vertically by seven degrees. The substrates can be loaded without touching their front side.

概要

用途: photovoltaics, precision optics

基板形状: flat/rigid

基板材料: glass, metals, polymer, wafers

製膜技術: magnetron sputtering down, magnetron sputtering up

機能: anti-reflection, contact, passivation, TCO

成膜層および層構造: Ag, Al, AlOx, AZO, Cu, ITiO, ITO, NiV, SiN, SiOx, Ti, TiOx, Zn


該当装置

OPTA X

回転プレート製膜システム

HISS

Horizontal Coating System

Production/Internet/Live