HWCVD/CAT-CVD/ICVD

Pioneered by Prof. Matsumura in 1983, catalytic CVD is a very effective deposition technology. Driven by a hot wire, precursor molecules are exothermically dissociated, activated and finally deposited on a substrate. This deposition method is not plasma enhanced, therefore accelerated ions do not exist. A very smooth, highly conformal deposition with very low internal layer stress can be accomplished at high deposition rates.

Using hot wires to do plastic polymerization out of the monomer phase without solvents is termed initiated CVD or iCVD, respectively, if a thermally labile initiator is additionally fed into the stream of monomers. This production method was initially explored by Prof. Karen K. Gleason. It allows controlling finely the possible reaction pathways and fully retaining the polymer characteristic. By depositing polymers from the vapor phase, many wetting and solution effects are avoided, and conformal films can be created.

Von Ardenne offers hot wire sources for catCVD and iCVD applications. For inline and dynamic deposition processes a particular line source is available. It consists of a especially designed source flange and a quick to install wire subcomponent, which facilitates shorter downtimes by simply exchanging the entire subcomponent, if necessary.

In order to have a longer productive coating time, the HWCVD source can be equipped with independent sub-sources. In the case of wire degradation, a currently running sub-source can be switched off while another sub-source overtakes the process. The source can optionally be equipped with a pyrometric measuring device for e.g. precise wire temperature readings.

For maximum flexibility, the entire hot wire source can be swapped against a Linear PECVD source (CCP CVD), as flange compatibility can be requested.

Технологическая компетенция
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